Nickel Conductive Film Coating / Nickel Sputtering Metallization / PVD Ni Conductive Thin Film  

As the serious pollution of air, water caused by chemical material during the surface treatment, the eletroplating method is urgently need to be replaced by an advanced coating technology. 

PVD magnetron sputtering coating is used for Nano thin films generation. Metal film, conductive film, non-conductive film etc. are all possible with sputtering technology, which represents a real alternative of electroplating due to its  free hazard and 100% environment friendly. 

PVD sputtering gives a combination of advantages like no other:

• It is totally economically efficient generating the thinnest and most uniform coating films; 
• It is a dry coating process at low temperature in a vacuum chamber; 
• It offers great versatility, can be used for the deposition of conductive or non-conductive materials on any 
• type of substrates, like: metals, ceramics, plastic materials. 
• Multi layers coating are available.  

The MSC-1215 is designed for thin conductive film's coating on cell phones, communication tools, computers etc. eletronics components. 

Substrate: Aluminum Plate 

Sputtering Materials for conductive  films:  Cu (Copper), Ni (Nickel), Ag (silver) based on different coating recipes and coating processes requirement. 

Please contact us today, Vakia Vacuum Coating is honored to be your your business partner.