Operational principle:
Sputtering is physical phenomenon that electron collide with argon atoms and turn into Argon ions and electron ions when electron accelerated flying towards the substrate under the electric field effect. Thereafter, the argon ions accelerated bombard target in the electric field, that will sputter a large number of target atoms, neutral target atoms (or molecules) depositing on the surface of the substrate forming a layer or multi-layers decorative and functional film. 
Equipment configuration: 
Structure type: vertical type or Horizontal type
Chamber type: single door or double doors
Power type: DC or Mid-frequency

Application field:
It can be widely used in high-grade decorative and functional films for watch, glasses , communications, electronics, machinery, decoration and transportation aviation and other industries.

Main feature:
1, Higher deposition rate, less temperature rise, better avoid target destroyed and polluted 
2, High-energy that released though the sputtering make the film density and adhesion improved significantly;
3, Touch screen + PLC, to achieve automatic control, automatic / manual switch anytime;
4, The coating chamber with a high volume, big loading capacity, high production efficiency.
5, The work-piece rotation frame with public structure can be set to automatically reversing, it can ensure the coating uniformity;
6, The whole configuration is reasonable, high pumping rate, low noise, low power consumption;
7, This device deposited film in density, uniformity, purity, hardness, etc. are able to meet customer requirements

 it can coat the film directly at room temperature without heating, energy saving and productivity improvement.

  vacuum chamber that be made by SUS 304 stainless steel