Web Roll to Roll Sputtering Coating Machine Low-E Film Web Coater Conductive Film Deposition AIA-1 manufacturer from China SHANGHAI VAKIA COATING TECHNOLOGY CO.,LTD.

Web Roll to Roll Sputtering Coating Machine Low-E Film Web Coater Conductive Film Deposition

Place of Origin:

Guangdong, China (Mainland)


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Product Detail

Model No.: AIA-1

Web Roll to Roll Sputtering Coating Machine, Conductive Film Deposition, Low-E Film Web Coater

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Web Roll to Roll Sputtering Coating Machine, Conductive Film Deposition, Low-E Film Web Coater

We are pleased to propose our MultiWeb-Series Roll to Roll Vacuum Sputtering Web Coater to meet your multi-layer deposition requirements.

DEPOSITION FILMS
1. Substrate material: PET, PEN, PES, PI, PC, PA,... Films
2. Substrate thickness: 15~300μm
3. Deposition methods: AC Reactive for SiO2(Dielectric); Pulsed DC for ITO (Metal & Conductor)
4. Oxide conductor TCO: ITO, AZO, IZO...
5. Metal conductor: Al, Cu, Mo, Ag...
6. Optical film: Ta2O5, Nb2O5, SiO2, TiO2...
7. Semiconductor: ZnO, InGaZnO...
8. Insulator: SiO2, SiNx, AlOx, AlNx...
9. Uniformity: ±5% Across Web

The MultiWeb Coater provides the following key features:

A. One chamber divided into multi-pressure zones to accommodate various deposition sources.
B. Multi-Source simultaneous deposition capabilities in one web pass, for multi-layer coating.
C. Reversible web winding direction enables deposition of unlimited layers without breaking vacuum.
D. Precision web handling mechanisms with edge-guide to allow multiple passes without loss of alignment. (Optional)
E. AC Invert web drive system for accurate control of multiple web speeds.
F. In-line optical and/or resistance thickness monitoring systems, to control precise deposition thickness and uniformity. (Optional)
G. Chamber is constructed of SUS304L Stainless with low out gassing components to insure deeper vacuum.
H. Vacuum pumping by a combination of turbo-molecular pump and low temperature cryogenics, to provide clean vacuum without moisture or oil contamination.

GENERAL SPECIFICATIONS
Vacum chamber body: single chamber multi-pressure zones
Moveable carriages: Web Carriage
Deposion Zone: 2 X Sputtering Zone (Optional: 3 Sputtering Zone)
Sputtering Source: 2 X Dual Cathode Sputter Source (Optional: 3 Dual Cathode Sputter Source)
Substrate Pre-treater: Linear Ion Source
Web Width: 1300mm
Winding Diameter: Φ600mm Max
Winding Direction: Bi-directional
Substrate thickness: 15~300μm
Web Line Speed:0.5~10M/min
Web Tension: 5.0PLI Max 0.5PLI Min
Web Alignment: ±3mm (one pass)
Hi-Vacuum Pump: Turbo Pump
Rough Vacuum Pump: Dry pump & Blower combination
Moisture Pump: Polycold Cryogenic
Deposition Thickness Control: Monitoring (Optional)
a: Transmit Optical; b: Eddy Current Resistance
System Operation: PLC Based Computer System Operation